Inductive Coupled Plasma Mass Spectrum (ICP-MS) ye tɛknɔlɔji yam ye kɛ̈n ye kɛ̈n ye kɛ̈n ye kɛ̈n ye kɛ̈n ye kɛ̈n ye kɛ̈n ye kɛ̈n ye kɛ̈n ye kɛ̈n ye kɛ̈ Teknoloji ICP-MS ee tɛmɛ tɛmɛ tɛmɛ tɛmɛ tɛmɛ tɛmɛ tɛmɛ tɛmɛ tɛmɛ tɛmɛ tɛmɛ tɛmɛ tɛmɛ tɛmɛ tɛmɛ tɛmɛ tɛmɛ tɛmɛ tɛmɛ tɛmɛ tɛmɛ tɛmɛ tɛmɛ tɛmɛ tɛmɛ tɛmɛ

Agilent ICP-MS teknoloji ye luui në:
● Kuen ye kɛ̈ɛ̈r ye kɛ̈ɛ̈r ye kɛ̈ɛ̈r ye kɛ̈ɛ̈r ye kɛ̈ɛ̈r ye kɛ̈ɛ̈r ye kɛ̈ɛ̈r ye kɛ̈ɛ̈r
● Analyze of semiconductor materials
● Sample analysis cït glass, ceramic ku mineral metallurgy;
• puɔ̈ɔ̈c geoloji;
• Bio-food kɛnɛya kɛnɛya kɛnɛya kɛnɛya kɛnɛya kɛnɛya kɛnɛya kɛnɛya kɛnɛya kɛnɛya kɛnɛya;
● Analisis materiyali nuklear
● Analiz sampol petrokimikal;
• Applied and research in forensics (Applied and research in forensic) (Applied and research in forensic) (Applied and research in forensic) (Applied and research in forensic) (Applied and research in forensic)
● Kɔn cï looi, kä ye kek looi, kä ye kek looi, kä ye kek looi, kä ye kek looi, kä ye kek looi, kä ye kek looi, kä ye kek looi, kä ye kek looi, kä ye kek looi, kä ye kek looi, kä ye kek looi, kä ye kek looi
ICP-MS Analyzer Features:
● A lëu bï kä ye kek tɔ̈ɔ̈u thïn ya tïŋ në kaam tök
● Limit de détection minimum (low to ppq level) (Limit de détection minimum) (Limit de détection minimum) (Limit de détection minimum) (Limit de détection minimum) (Limit de détection minimum) (Limit de détection minimum) (Limit de détection minimum)
● Analyze benefit/cost ratio
● Kä ye kek looi ye kek looi ye kek looi ye kek looi ye kek looi ye kek looi ye kek looi ye kek looi ye kek looi ye kek looi ye kek looi ye kek looi ye kek looi ye kek looi
● Spectrum line ye nɔgɔ, ye nɔgɔ ye nɔgɔ ye nɔgɔ ye nɔgɔ ye nɔgɔ ye nɔgɔ ye nɔgɔ ye nɔgɔ ye nɔgɔ ye nɔgɔ ye nɔgɔ ye nɔgɔ ye
● Sample size wïc (ul to ml), analysis speed (1 ~ 3 min / sample)
● Modèle de détection flexible
Analysis of ultratrace contaminants in commonly used materials in semiconductor industry: Analyze of ultratrace contaminants in commonly used materials in semiconductor industry: Analyze of ultratrace contaminants in commonly used materials in semiconductor industry
Solid: Si; GaAa monocrystalline slice; Quartz, silicon carbide, ku kɔ̈k peei; Electrode metal ye cɔl high purity
Liquid: Pii cɛ̈ɛ̈r; HF;HNO3; HCI; H2SO4; H2O2; Ammoniak, etc.
Gas: SiH4; TE0S; NF3; N2 wala a taab
Agilent ICP-MS bï kä ye kek looi ya tïŋ:
Agilent ICP-MS's high-performance, high-power shielding rectangular plasma technology has been used to measure trace contamination elements in various organic samples. Agilent ICP-MS's high-performance, high-power shielding rectangular plasma technology has been used to measure trace contamination elements in various organic samples.
● Kɔc kɔ̈k cï kek ya looi, ka tɛ̈n yenë kek ya looi, ka tɛ̈n yenë kek ya looi, ka tɛ̈n yenë kek ya looi, ka tɛ̈n yenë kek ya looi, ka tɛ̈n yenë kek ya looi, ka tɛ̈n yenë kek ya looi, ka tɛ̈n yenë kek ya looi, ka tɛ̈n yenë kek ya looi, ka tɛ̈n yenë kek ya looi.
● Kɔɔr ye kɔɔr ye kɔɔr ye kɔɔr ye kɔɔr ye kɔɔr ye kɔɔr ye kɔɔr ye kɔɔr ye kɔɔr ye kɔɔr ye kɔɔr ye kɔɔr ye kɔɔr ye
● Organic solvents ye kɔc juëc luɔ̈ɔ̈i - toluene, diphthene, IPA, etc.
● Sample ye kɔnɔ ye kɔnɔ ye kɔnɔ ye kɔnɔ ye kɔnɔ ye kɔnɔ ye kɔnɔ ye kɔnɔ ye kɔnɔ ye kɔnɔ ye kɔnɔ ye kɔnɔ ye kɔnɔ ye kɔnɔ ye kɔnɔ ye kɔnɔ ye kɔnɔ ye kɔnɔ